Extreme ultraviolet free-electron laser-based projection lithography systems

• 1 January 1991
• journal article
• Published by SPIE-Intl Soc Optical Eng in Optical Engineering
• Vol. 30  (8) , 1100-1108
• https://doi.org/10.1117/12.55914

Abstract

Keywords

• ELECTRONS
• EXTREME ULTRAVIOLET
• LASERS
• PROJECTION LITHOGRAPHY