Epitaxial ferroelectric thin films prepared by the Sol-Gel technique
- 1 May 1997
- journal article
- research article
- Published by Taylor & Francis in Ferroelectrics
- Vol. 195 (1) , 283-288
- https://doi.org/10.1080/00150199708260538
Abstract
The sol-gel process was used to fabricate epitaxial thin films of crystalline ferroelectric oxides, including KNbO3 film on single crystal substrates of MgO and SrTiO3, LiNbO3 film on LiTaO3 and alternatively multilayer nX(SrTiO3/PbTiO3) films on SrTiO3. Fabrication of these epitaxial thin films will be described. The structure of these films has been studied with X-ray, electron diffraction, and high resolution electron microscopy. Second harmonic generation of 1064 nm incident light was demonstrated in KNbO3 waveguides. Transient photorefractive gratings in Fe-doped KNbO3 were studied by a two-beam coupling technique at various writing intensity and wavelengthKeywords
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