Ion implantation in semiconductor device technology
- 1 January 1972
- journal article
- Published by Institution of Engineering and Technology (IET) in Radio and Electronic Engineer
- Vol. 42 (6) , 265-283
- https://doi.org/10.1049/ree.1972.0044
Abstract
The role of ion implantation in the fabrication of semiconductor devices is reviewed with special reference to silicon planar technology. The applications of ion implantation to various devices is discussed in detail. A summary is given of the present state of the art in the compound semiconductor field.Keywords
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- Select bibliographyPublished by Cambridge University Press (CUP) ,1972