Organosilicon deep UV positive resist consisting of poly(p-disilanylenephenylene)

• 20 November 1987
• journal article
• research article
• Published by Wiley in Journal of Applied Polymer Science
• Vol. 34  (7) , 2445-2455
• https://doi.org/10.1002/app.1987.070340709

Abstract

Keywords

• UV POSITIVE
• ORGANOSILICON DEEP
• DEEP UV
• DISILANYLENEPHENYLENE
• POSITIVE RESIST
• POLY
• LAYER RESIST
• LITHOGRAPHIC APPLICATIONS
• RESIST CONSISTING