Oxidized Boron Nitride Wafers as an In-Situ Boron Dopant for Silicon Diffusions

• 1 January 1973
• journal article
• Published by The Electrochemical Society in Journal of the Electrochemical Society
• Vol. 120  (9) , 1266
• https://doi.org/10.1149/1.2403675

Abstract

Keywords

• OXIDIZED BORON
• NITRIDE WAFERS
• SITU BORON
• BORON DOPANT
• SILICON DIFFUSIONS
• BORON NITRIDE