Photoreaction mechanism for amorphous peroxopolytungstic acid as an inorganic photoresist material
- 31 October 1989
- journal article
- Published by Elsevier in Journal of Photochemistry and Photobiology A: Chemistry
- Vol. 49 (3) , 377-385
- https://doi.org/10.1016/1010-6030(89)87135-7
Abstract
No abstract availableKeywords
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