Photoelectrochemical Properties of Thin γ-Fe2O3 Films Formed by MO-CVD Technique

• 1 January 1988
• journal article
• Published by Japan Institute of Metals in Journal of the Japan Institute of Metals and Materials
• Vol. 52  (2) , 189-198
• https://doi.org/10.2320/jinstmet1952.52.2_189

Abstract

Keywords

• PHOTOCURRENT
• PHOTOPOTENTIAL METALORGANIC CHEMICAL VAPOR DEPOSITION
• IRON OXIDE
• THIN FILM
• BODE DIAGRAM
• SURFACE-STATE