Deposition of PbTiO3 thin films from thd-complexes by an aerosol source MOCVD method
- 1 December 1995
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 29 (1-4) , 205-208
- https://doi.org/10.1016/0167-9317(95)00146-8
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Electrical Properties for Capacitors of Dynamic Random Access Memory on (Pb, La)(Zr, Ti)O3 Thin Films by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1994
- YBCO and BSCCO thin films prepared by wet MOCVDJournal of Materials Chemistry, 1994
- Preparation and Evaluation of Pb(Zr·Ti)O3 Thin Films by Metalorganic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1992