A theoretical derivation of the log-normal distribution of time-dependent dielectric breakdown in thin oxides
- 31 July 1989
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 32 (7) , 541-546
- https://doi.org/10.1016/0038-1101(89)90110-x
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Dielectric breakdown in electrically stressed thin films of thermal SiO2Journal of Applied Physics, 1978
- Electrochemical Charging of Thermal SiO2 Films by Injected Electron CurrentsJournal of Applied Physics, 1971