Fabrication of two-dimensional InP-based photonic crystals by chlorine based chemically assisted ion beam etching
- 1 March 2004
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 22 (2) , 707-709
- https://doi.org/10.1116/1.1688353
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Low-loss InP-based photonic-crystal waveguides etched with Ar/Cl2 chemically assisted ion beam etchingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2003
- Radiation losses in planar photonic crystals: two-dimensional representation of hole depth and shape by an imaginary dielectric constantJournal of the Optical Society of America B, 2003
- Hole depth- and shape-induced radiation losses in two-dimensional photonic crystalsApplied Physics Letters, 2003
- Separation of radiation and absorption losses in two-dimensional photonic crystal single defect cavitiesJournal of Applied Physics, 2002
- Optical characterisation of 2D InP-based photonic crystals fabricated by inductively coupled plasma etchingElectronics Letters, 2002
- Optical study of two-dimensional InP-based photonic crystals by internal light source techniqueIEEE Journal of Quantum Electronics, 2002
- Time‐domain 2D modeling of slab‐waveguide based photonic‐crystal devices in the presence of radiation lossesMicrowave and Optical Technology Letters, 2002
- Dry Etching of Photonic Crystals in InP Based MaterialsPhysica Scripta, 2002
- Radiation losses of waveguide-based two-dimensional photonic crystals: Positive role of the substrateApplied Physics Letters, 2000
- Photonic crystals and microdisk cavities based on GaInAsP-InP systemIEEE Journal of Selected Topics in Quantum Electronics, 1997