Chemical composition and crystalline structure of SnO2 thin films used as gas sensors
- 1 July 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 304 (1-2) , 113-122
- https://doi.org/10.1016/s0040-6090(97)00219-8
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Influence of Oxygen Partial Pressure and Heat Treatment on the Properties of Reactively Sputtered In2O3 FilmsPhysica Status Solidi (a), 1996
- Recent developments in semiconducting thin-film gas sensorsSensors and Actuators B: Chemical, 1995
- SnO2 sensors: current status and future prospectsSensors and Actuators B: Chemical, 1995
- Interpretation of EXAFS DataJournal of Synchrotron Radiation, 1995
- Tin dioxide thin-film gas sensor prepared by chemical vapour deposition: Influence of grain size and thickness on the electrical propertiesSensors and Actuators B: Chemical, 1994
- Solid‐State Gas Sensors: A ReviewJournal of the Electrochemical Society, 1992
- Mixed phase nanocrystalline boron nitride films: Preparation and characterizationThin Solid Films, 1991
- Some aspects of the interaction of oxygen with polycrystalline SnOx thin filmsSensors and Actuators B: Chemical, 1990
- Oxygen chemisorption on tin oxide: Correlation between electrical conductivity and EPR measurementsJournal of Vacuum Science and Technology, 1980
- Ab initio calculations of amplitude and phase functions for extended x-ray absorption fine structure spectroscopyJournal of the American Chemical Society, 1979