Local Structure of ECR Process Plasma
- 1 November 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (11R) , 2491-2496
- https://doi.org/10.1143/jjap.29.2491
Abstract
Characteristics of an ECR process plasma produced by 2.45 GHz microwave radiation in hydrogen gas were studied, paying attention to the localized feature of ECR phenomenon in a nonuniform magnetic field. At a pressure of over 3 × 10-1 Pa, a strongly nonuniform axial temperature distribution of electrons was observed, and the temperature control was found to be possible mainly near the resonance region. It was verified that variation of the radial wall dimension of the vacuum chamber gave a remarkable influence to the plasma parameter near the resonance region. Spatial structure of the plasma in mirror and divergent magnetic field configurations was found to be nearly the same in a high-pressure-range over 1 × 10-1 Pa.Keywords
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