Summary Abstract: The role of low-energy ion bombardment during the growth of epitaxial TiN(100) films by reactive magnetron sputtering: Defect formation and annihilation
- 1 July 1987
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 5 (4) , 2162-2164
- https://doi.org/10.1116/1.574946
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