Epitaxial Growth of Films on Substrates Coated with Amorphous Deposits
- 1 February 1969
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 40 (2) , 906-907
- https://doi.org/10.1063/1.1657493
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Oriented nucleation by the long-range effect at vacuum condensation of gold on NaClThe Science of Nature, 1968
- MOVING MASK GROWTH OF SINGLE-CRYSTAL SILICON FILMS ON AMORPHOUS QUARTZ SUBSTRATESApplied Physics Letters, 1968
- Decoration of NaCl single crystal cleavage surface, covered by an amorphous carbon layer, at vacuum condensation of PbSJournal of Crystal Growth, 1968
- Controlled Crystalline Orientation of Sputtered Ferromagnetic Films on Amorphous SubstratesJournal of Applied Physics, 1967
- ORIENTATION EFFECTS OF AN APPLIED DC FIELD ON NaCl FILMS DEPOSITED ON SILICA GLASSApplied Physics Letters, 1967
- Polymorphic transformation in epitaxial CdS filmsSurface Science, 1967
- A Dislocation-free Mechanism of Growth of Real CrystalsNature, 1966
- Influence of Electric Field on the Growth of Thin Metal FilmsJournal of Applied Physics, 1966
- The nucleation, growth, structure and epitaxy of thin surface filmsAdvances in Physics, 1965
- The study of epitaxy in thin surface filmsAdvances in Physics, 1956