Photoreactive fluorinated polyimide protected by tetrahydropyranyl (THP) group based on chemical amplification: Acid generation in polyimide film and lithographic properties

This publication has 14 references indexed in Scilit:

• Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
  Published by Elsevier ,2003
• Tetrahydropyranyl protected polyhydroxy-styrene for a chemically amplified deep u.v. resist
  Polymer, 1992
• Acid generation and deprotecting reaction by diphenyliodonium 9,10‐dimethoxyanthracene‐2‐sulfonate in a novolak positive photoresist based on chemical amplification
  Polymers for Advanced Technologies, 1992
• Photoinduced intramolecular electron transfer mechanism for photochemical dissociation of para-substituted benzyl 9,10-dimethoxyanthracene-2-sulfonates
  The Journal of Physical Chemistry, 1992
• Intra-ion-pair Electron Transfer Mechanism for Photolysis of Diphenyliodonium Salt Sensitized by 9,10-Dmethoxyanthracene-2-sulfonate Counteranion
  Chemistry Letters, 1991
• Tetrahydropyranyl‐ and furanyl‐protected polyhydroxystyrene in chemical amplification systems
  Journal of Applied Polymer Science, 1991
• Fluorine-containing photoreactive polyimide. 6. Synthesis and properties of a novel photoreactive polyimide based on photo-induced acidolysis and the kinetics for its acidolysis
  Macromolecules, 1990
• Soluble and optically transparent fluorine‐containing photoreactive polyimide precursors: Spectral sensitization by organic peroxide and organic dye combination
  Polymer Engineering & Science, 1989
• Positive Photoreactive Polyimides. II. Preparation and Characterization of Polyimide Precursors Containing α-(2-Nitrophenyl)ethyl Ester Side Chains
  Journal of Macromolecular Science: Part A - Chemistry, 1987
• Chemical amplification in the design of dry developing resist materials
  Polymer Engineering & Science, 1983