High resolution electron beam lithography on CaF2
- 15 February 1984
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 44 (4) , 468-469
- https://doi.org/10.1063/1.94769
Abstract
We have fabricated 30‐nm lines on 200‐nm centers in CaF2 using a scanning transmission electron microscope. The lines were written by electron beam radiolysis of a fine grain polycrystalline CaF2 film and reaction to CaO followed by development in H2O.Keywords
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