The use of ac power on cylindrical magnetrons
- 1 September 1997
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 218, 35-37
- https://doi.org/10.1016/s0022-3093(97)00195-6
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- A quasi-direct-current sputtering technique for the deposition of dielectrics at enhanced ratesJournal of Vacuum Science & Technology A, 1988
- Development of Continuous Sputtering MachinesJournal of Vacuum Science and Technology, 1973
- A New AC Sputtering Technique for the Deposition of Thin FilmsIEEE Transactions on Parts, Hybrids, and Packaging, 1972
- Compositional Control of Tantalum–Aluminum Alloy Films by a dc Biased, ac Sputtering TechniqueJournal of Vacuum Science and Technology, 1972