Integrated system for deposition of polysilicon and WSix films

• 1 August 1994
• journal article
• Published by Elsevier in Microelectronic Engineering
• Vol. 25  (2-4) , 201-208
• https://doi.org/10.1016/0167-9317(94)90016-7

Abstract

Keywords

• SYSTEM FOR DEPOSITION
• INTEGRATED SYSTEM
• STRUCTURES
• CHAMBER
• WAFER
• POLYCIDE
• WSIX
• ENCOUNTERED
• DEPOSITION OF POLYSILICON