The Use of an Interference Microscope for Measurement of Extremely Thin Surface Layers

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Abstract
A method is given for the thickness measurement of p-type or n-type surface layers on semiconductors. This method requires the use of samples with optically flat and reflecting surfaces. The surface is lapped at a small angle in order to expose the p-n junction. After detecting and marking the p-n junction, the thickness is measured by an interference microscope. Another application of the equipment is the measurement of steps in a surface. The thickness range measurable is from 5 × 10−6 cm to 10−3 cm.