Vaporization process of SiO2 particles for slurry injection in inductively coupled plasma atomic emission spectrometry

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Abstract
In this work, the vaporization process of SiO2 particles in an ICP was theoretically and experimentally investigated. The emission intensity of Si I for the three different sizes of SiO2 particles, 0.35, 1.4 and 2.5 µm, was measured as the observation height varied. Based on these experimental heights, the heat-transfer and mass-transfer models were applied in order to understand the vaporization process of SiO2 particles in an ICP. When a heat-transfer-controlled model is considered for the process, the rate for a SiO2 particle in the tested size became comparable to that obtained by experiment. SiO2 particles in the range of 0.3–2.6 µm seemed to be vaporized by a heat-transfer-controlled mechanism, rather than by a Knudsen-effect-corrected heat-transfer-controlled or mass-transfer-controlled mechanism in an atmospheric pressure ICP.

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