Phase separation in alloy-Si interaction
- 15 February 1980
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 36 (4) , 331-333
- https://doi.org/10.1063/1.91482
Abstract
Phase separation has been found to be a general phenomenon among many alloy‐Si interactions at temperatures as high as 800 °C. We have studied these interactions with alloys consisting of a near‐noble metal of Ni, Pd, and Pt, and a refractory metal of Cr, V, and W. The interaction produces a silicide of the near‐noble metals next to the Si and an outer layer of silicide of the refractory metals. No evidence for ternary formation has been found.Keywords
This publication has 2 references indexed in Scilit:
- Silicide formation with Pd-V alloys and bilayersJournal of Applied Physics, 1979
- Silicide formation with nickel and platinum double layers on siliconThin Solid Films, 1978