Gas-phase oxidation and sulphidation of Si+(2P), SiO+ and SiS+
- 1 January 1989
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of the Chemical Society, Faraday Transactions 2: Molecular and Chemical Physics
- Vol. 85 (10) , 1643-1654
- https://doi.org/10.1039/f29898501643
Abstract
Experimental results are presented for a selected-ion flow tube (SIFT) study of the kinetics of oxidation and sulphidation of Si+(2P), SiO+ and SiS+ with the molecules O2, NO, CO2, NO2, N2O, COS, CS2 and SO2 at 294 ± 2K. Both adduct ions and bimolecular products were identified. The bimolecular oxidation and sulphidation reactions of Si+(2P) which were observed to form SiO+, SiO, SiS+ or SiS by atom or atomic anion transfer are shown to be thermodynamically controlled. Adduct formation is viewed in terms of a model involving O-atom transfer within the intermediate complex. The same model also provides reasonable mechanisms for the bimolecular oxidation and sulphidation reactions of Si+, SiO+ and SiS+ which were observed. The implications of the results are discussed for the oxidation and sulphidation of silicon ions in general, and in the interstellar medium in particular.Keywords
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