Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures

7 April 2003

journal article
Published by Optica Publishing Group in Optics Express

Vol. 11 (7) , 775-781
https://doi.org/10.1364/oe.11.000775

Abstract

The combination of selective chemical etching and atomic force microscopy has been used for the first time to make ultra-high spatial resolution (20 nm) index of refraction profiles of femtosecond laser modified structures in silica glass.

Keywords

FEMTOSECOND LASER WRITING
HIGH POWER LASERS
NEAR FIELD MICROSCOPY
REFRACTIVE INDEX
SCANNING ELECTRON MICROSCOPY
SCANNING PROBE MICROSCOPY

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