The influence of deposition temperature on the electrical resistance of thin Cu films
- 2 October 1987
- journal article
- Published by Elsevier in Surface Science
- Vol. 189-190, 1103-1110
- https://doi.org/10.1016/s0039-6028(87)80556-3
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The influence of deposition temperature on the crystalline and electrical properties of thin silver filmsThin Solid Films, 1986
- Surface Debye-Waller factors for Cr(100) and Mo(100)Surface Science, 1971