Characterization of interface roughness in W/Si multilayers by high resolution diffuse X-ray scattering
- 1 April 1996
- journal article
- Published by Elsevier in Physica B: Condensed Matter
- Vol. 221 (1-4) , 13-17
- https://doi.org/10.1016/0921-4526(95)00899-3
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- Determination of the static scaling exponent of self-affine interfaces by nonspecular x-ray scatteringPhysical Review B, 1995
- Kinetic Roughness of Amorphous Multilayers Studied by Diffuse X-Ray ScatteringPhysical Review Letters, 1994
- Interfacial roughness of sputtered multilayers: Nb/SiPhysical Review B, 1993
- Ion-assisted sputter deposition of molybdenum-silicon multilayersApplied Optics, 1993
- Determination of interfacial roughness correlation in W/C multilayer films: Comparison using soft and hard x-ray diffractionJournal of Applied Physics, 1993
- X-ray diffraction measurement of partially correlated interfacial roughness in multilayersJournal of Applied Physics, 1993
- Multilayer x-ray mirrors: Interfacial roughness, scattering, and image qualityJournal of Applied Physics, 1993
- Interfacial roughness correlation in multilayer films: Influence of total film and individual layer thicknessesJournal of Applied Physics, 1992
- Critical Phenomena at Surfaces and InterfacesPublished by Springer Nature ,1992
- Determination of roughness correlations in multilayer films for x-ray mirrorsJournal of Applied Physics, 1991