Electron optical column for high speed nanometric lithography
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 123-131
- https://doi.org/10.1016/0167-9317(86)90038-9
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- A high-speed, high-precision electron beam lithography system (electron optics)Journal of Vacuum Science & Technology B, 1985
- A simplified focusing and deflection system with vertical beam landingJournal of Vacuum Science & Technology B, 1983