A Model of Growth Rate Nonuniformity in the Simultaneous Deposition and Doping of a Polycrystalline Silicon Film by LPCVD
- 1 May 1987
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 134 (5) , 1275-1281
- https://doi.org/10.1149/1.2100657
Abstract
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