Halogen uptake by thin SiO2 layers on exposure to HBr/O2 and Cl2 plasmas, investigated by vacuum transfer x-ray photoelectron spectroscopy
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (3) , 1571-1576
- https://doi.org/10.1116/1.581189
Abstract
No abstract availableKeywords
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