Surface chemical bonding of (NH4)2Sx-treated InP(001)
- 18 January 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (3) , 297-299
- https://doi.org/10.1063/1.108996
Abstract
(NH4)2Sx‐treated InP(001) surfaces were analyzed by using synchrotron radiation photoelectron spectroscopy to characterize the S‐passivated surfaces and elucidate the solution etching mechanism. Polysulfide chemical states were observed for the first time in both the P 2p and In 4d spectra. Monosulfide and polysulfide states were also evident in the S 2p spectra. Etching models consistent with the experimental results were discussed.Keywords
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