The structure of nickel and cobalt films on the (111) surface of n-type silicon
- 1 February 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 15 (2) , 173-180
- https://doi.org/10.1016/0040-6090(73)90040-0
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- The (111) Surface of n-Type SiliconJournal of Vacuum Science and Technology, 1972
- Elastic and Inelastic Low-Energy Electron Diffraction (LEED) from SolidsJournal of Vacuum Science and Technology, 1972
- Auger electron spectroscopy and its application to surface studiesReview of Physics in Technology, 1972
- Auger electron spectroscopySurface Science, 1971
- Low-energy electron diffractionInternational Materials Reviews, 1971
- An improved apparatus for the measurement of Auger electron spectraJournal of Physics E: Scientific Instruments, 1969
- Some remarks on the epitaxial growth of films on substrates coated with amorphous depositsThin Solid Films, 1969
- Reply to the comment of H.K. Lintz concerning “LEED study of a nickel induced surface structure on silicon (111)”Surface Science, 1968
- Improved epitaxy of nickel on rocksalt substrates due to electron bombardmentThin Solid Films, 1967
- The Crystal Structure of Evaporated Gold FilmsPhysica Status Solidi (b), 1965