Improvement of Ta filament for diamond CVD
- 1 April 1998
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 317 (1-2) , 371-375
- https://doi.org/10.1016/s0040-6090(97)00626-3
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Diamond growth by hot-filament chemical vapor deposition: state of the artDiamond and Related Materials, 1993
- Carburization of tungsten and tantalum filaments during low-pressure diamond depositionSurface and Coatings Technology, 1991
- Diamond deposition on cemented carbide by chemical vapour deposition using a tantalum filamentJournal of Materials Science, 1990
- Growth of diamond particles from methane-hydrogen gasJournal of Materials Science, 1982