Multicusp sources for ion beam projection lithography

1 February 1998

journal article
Published by AIP Publishing in Review of Scientific Instruments

Vol. 69 (2) , 877-879
https://doi.org/10.1063/1.1148469

Abstract

Multicusp ion sources are capable of producing positive and negative ions with good beam quality and low energy spread. The ion energy spread of multicusp sources has been measured by three different techniques. The axial ion energy spread has been reduced by introducing a magnetic filter inside the multicusp source chamber which adjusts the plasma potential distribution. The axial energy spread is further reduced by optimizing the source configuration. Values as low as 0.8 eV have been achieved.

Keywords

This publication has 2 references indexed in Scilit:

A compact filament-driven multicusp ion source
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1996
Production of low energy spread ion beams with multicusp sources
Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1996