Simulation of defects in 3-dimensional resist profiles in optical lithography
- 1 March 1991
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 13 (1-4) , 497-501
- https://doi.org/10.1016/0167-9317(91)90141-y
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Simulation of lithographic images and resist profilesMicroelectronic Engineering, 1990
- Coherence of defect interactions with features in optical imagingJournal of Vacuum Science & Technology B, 1987
- Modeling projection printing of positive photoresistsIEEE Transactions on Electron Devices, 1975