Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluoro‐Trialkoxy‐Silane Group and Pure Water as Gas Sources
- 1 December 1993
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 140 (12) , 3599-3603
- https://doi.org/10.1149/1.2221132
Abstract
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