Surface chemical analysis of polydiacetylene films exposed to electron beam and ultraviolet irradiation

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Abstract
We have investigated the properties and exposure chemistry of a soluble polydiacetylene film used as a negative electron beam resist. This paper summarizes a series of investigations of the chemical changes induced by electron beam and UV irradiation of poly[5,8-(bis-1,12-n-butylcarboxy–methylene–urethane) dodecadiyne], P4BCMU, and its monomer. The exposure induced chemical changes have been studied with a number of spectroscopic techniques including Fourier transform infrared spectroscopy for information on the pendant groups of the polydiacetylene backbone, resonance Raman scattering for details of the polymer backbone, and x-ray photoelectron spectroscopy for elemental and bonding information. Detailed spectroscopic studies indicate that the unsaturated carbon–carbon bonds in the polymer backbone are not destroyed by irradiation, but rather the main change occurs in the N–H and C=O (carbonyl) bonds of the urethane group.

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