Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- 31 January 1994
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 23 (1-4) , 247-252
- https://doi.org/10.1016/0167-9317(94)90148-1
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Prospects for x-ray lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992