Measurement of very low-loss silica on silicon waveguides with a ring resonator
- 4 February 1991
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 58 (5) , 444-445
- https://doi.org/10.1063/1.104628
Abstract
The loss in phosphorus-doped silica on silicon waveguides was accurately measured using a 6-cm-diam ring resonator, by recording the transmission of a narrow linewidth external-cavity laser through the resonator as a function of temperature. A finesse of 45 and resonance width of 24.2 MHz were obtained, indicating guide loss of 2.6 dB per meter, which is the best result thus far measured for these waveguides. The shift in the modes with temperature was measured in the temperature range 30–120 °C and found to be close to 1/8 Å/deg.Keywords
This publication has 3 references indexed in Scilit:
- Very low-loss GeO 2 -doped silica waveguides fabricated by flame hydrolysis deposition methodElectronics Letters, 1990
- Integrated four-channel Mach-Zehnder multi/demultiplexer fabricated with phosphorous doped SiO/sub 2/ waveguides on SiJournal of Lightwave Technology, 1988
- Performance characteristics of 1.5-µm external cavity semiconductor lasers for coherent optical communicationJournal of Lightwave Technology, 1987