Fast electron pattern generator–high resolution: A variable shaped beam system for submicron writing
- 1 January 1986
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 4 (1) , 78-82
- https://doi.org/10.1116/1.583398
Abstract
Fast electron pattern generator–high resolution (FEPG‐HR) is a variable shaped electron beam system, derived from FEPG, specially designed for submicron direct writing, while keeping the multipurpose capabilities. Quarter‐micron linewidth is expected, thanks to a high demagnification of the stencil, reduction of the space charge effect, improvements in accurate metrology, and automatic calibration.Keywords
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