Detailed optical characterization of a near diffraction limited xenon fluoride laser
- 1 January 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Quantum Electronics
- Vol. 24 (12) , 2467-2476
- https://doi.org/10.1109/3.14378
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Transient refractive index measurements in XeF laser gas mixturesIEEE Journal of Quantum Electronics, 1989
- Strehl ratio for primary aberrations in terms of their aberration varianceJournal of the Optical Society of America, 1983
- Figures Of Merit For Short Wavelength LasersPublished by SPIE-Intl Soc Optical Eng ,1981
- Calculation of the near field phase in unstable resonators with mirror misfiguresApplied Optics, 1981
- Improved beam quality in double discharge excimer lasersApplied Optics, 1977
- Evaluation of Large Aberrations Using a Lateral-Shear Interferometer Having Variable ShearApplied Optics, 1975
- Characteristics of Phase-Aberrated Nondiffraction-Limited Laser BeamsApplied Optics, 1974
- Method for Evaluating Lateral Shearing InterferogramsApplied Optics, 1974
- Double Frequency Grating Lateral Shear InterferometerApplied Optics, 1973
- Unstable resonators and their applications (review)Soviet Journal of Quantum Electronics, 1972