Dopant incorporation in epitaxial germanium grown on Ge(100) substrates by MBE
- 2 May 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 111 (1-4) , 847-855
- https://doi.org/10.1016/0022-0248(91)91095-r
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- AlGaAs/Ge/GaAs heterojunction bipolar transistors grown by molecular beam epitaxyIEEE Electron Device Letters, 1990
- Origin and reduction of interfacial boron spikes in silicon molecular beam epitaxyApplied Physics Letters, 1988
- P n p GaAs/Ge/Ge phototransistor grown by molecular beam epitaxy: Implications for bipolar and hot-electron transistorsApplied Physics Letters, 1986