Plasma enhanced CVD silicon oxide films for integrated optic applications

• 1 April 1999
• journal article
• Published by Elsevier in Vacuum
• Vol. 52  (4) , 395-400
• https://doi.org/10.1016/s0042-207x(98)00299-1

Abstract

Keywords

• PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITED (PECVD)
• SILICON OXIDE
• FILM PROPERTIES