Bias assisted etching of diamond in a conventional chemical vapor deposition reactor
- 12 April 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (15) , 1803-1805
- https://doi.org/10.1063/1.109555
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Diamond transistor performance and fabricationProceedings of the IEEE, 1991
- Reactive ion etching of diamondApplied Physics Letters, 1989
- Ion-beam-assisted etching of diamondJournal of Vacuum Science & Technology B, 1985
- Etching of diamond with argon and oxygen ion beamsJournal of Vacuum Science & Technology A, 1984