Magnetron reactive ion etching of group III-nitride ternary alloys

• 1 May 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology A
• Vol. 14  (3) , 1046-1049
• https://doi.org/10.1116/1.580131

Abstract

Keywords

• REACTIVE ION ETCHING
• MAGNETRON REACTIVE
• III NITRIDE
• TERNARY ALLOYS
• GROUP III