Growth of high quality amorphous silicon-germanium films using low pressure remote electron-cyclotron-resonance discharge
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 563-566
- https://doi.org/10.1016/0022-3093(95)00764-4
Abstract
No abstract availableThis publication has 1 reference indexed in Scilit:
- A critical investigation of a-Si:H photoconductivity generated by subgap absorption of lightJournal of Non-Crystalline Solids, 1989