Abstract
The increasing demands for surface and thin film compositional analyses have fostered the development of a variety of analytical techniques. Three of these techniques, secondary ion mass spectrometry, Auger electron spectrometry, and MeV ion backscattering spectrometry, have become the most widely used for thin film compositional analysis. This paper discusses the relative merits of these three techniques with respect to a variety of analytical features such as sensitivity, matrix effects, and spatial resolution.
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