Near-field optical readout for phase-changed marks

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Abstract
We have observed near-field optical images of phase change marks and evaluated the readout signals including the optical near-field. Samples were composed of multilayered structures on glass substrates. Crystalline marks were recorded by a focused laser beam with an optical microscope in the as-deposited amorphous films. In readout, the optical and the topographical images of the recorded marks were evaluated at the same time by a collection mode near-field scanning optical microscope (NSOM). The surface profiles showed less than 1 nm dips around the marks. Therefore it means that the NSOM image of phase change marks depends on the refractive index change. The evaluated signal modulation of the optical image showed a sinusoidal curve to the top SiN layer thickness, and the maximum modulation was 60 percent.

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