Sensitive Electron Beam Resist Systems Based On Acid-Catalyzed Deprotection

22 August 1989

proceedings article
Published by SPIE-Intl Soc Optical Eng

p. 11-21
https://doi.org/10.1117/12.953013

Abstract

Poly(p-t-butoxycarbonyloxystyrene) (PBOCST) and poly(t-butyl p-vinylbenzoate) (PTBVB) provide sensitive, negative tone, electron beam resist systems when sensitized with "onium salt" acid generators. The sensitivity is high (0.5-2.5μC/cm² at 20 keV) owing to chemical amplification. The resolution and contrast are also high owing to the polarity change incorporated in the design. Development with an organic solvent provides sub-half-micrometer resolution.

Keywords

ELECTRON BEAMS
CHEMICALS

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