Dislocation Reduction on Simox Substrates by Using Multiple Implants

This publication has 3 references indexed in Scilit:

• SIMOX SOI for integrated circuit fabrication
  IEEE Circuits and Devices Magazine, 1987
• A model for the oxidation of silicon by high dose oxygen implantation
  Thin Solid Films, 1985
• An Investigation of the Properties of an Epitaxial Si Layer on a Substrate with a Buried SiO₂ Layer Formed by Oxygen-Ion Implantation
  Japanese Journal of Applied Physics, 1982