Growth studies and characterisation of In2S3 thin films deposited by atomic layer deposition (ALD)
- 1 January 2004
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 222 (1-4) , 65-73
- https://doi.org/10.1016/j.apsusc.2003.08.011
Abstract
No abstract availableKeywords
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