Mass-separated negative-ion-beam deposition system

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Abstract
We developed a mass-separated negative-ion-beam deposition system to investigate the interactions between low-energy negative ions and solid surfaces and evaluated its usefulness as an advanced technique for film formation. The deposition system consists of an intense negative-ion source and a negative-ion-beam deceleration electrode system. In the new type of sputter negative-ion source, 0.74 mA of mass-separated C− ion beam was produced in a high vacuum. The negative-ion-beam deceleration electrode system has a new structure to suppress the divergent effect of the beam, where a lens and a deceleration gap are closely placed. This structure is also simpler than any of the positive-ion-beam deceleration systems because production of oppositely charged particles, i.e., positive ions that might be accelerated in the deceleration field, can be neglected. A decelerated negative C− ion current of several tens of μA in the range of a final energy of 10–100 eV and about 100 μA in the range of over 100 eV were obtained. In a deposition test, a carbon film with several thousand Å in thickness was obtained in a few hours at a final energy of about 24 eV.

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